Synthesis of Carbon thin films using Aerosol-Assisted
Chemical Vapour Deposition (AACVD)
Naktal Al-Dulaimi *
1,2
Abstract
References
1 Department of Nanoscience and Applied Chemistry, Medical and Applied Science College, Charmo University, Chamchamal-Sulaimani,
Kurdistan Region, Iraq.
2 Charmo Center for Research Training and Consultancy, Charmo University, 46023 Chamchamal-Sulaimani, Kurdistan Region, Iraq.
*Corresponding author Email: naktal.abdulhafedh@charmouniversity.org
Abstract
Aerosol-assisted chemical vapour deposition (AACVD) technique was used to produce
carbon thin films. The synthesised films have been deposited using chloroform solvent as
a single source precursor at 550 °C. Raman spectroscopy, powder X-Ray diffraction (p.XRD), and scanning electron microscope (SEM) were used to characterize the thin films
and the result shows that carbon thin films successfully have been prepared. Carbon thin
films were produced from chloroform solvent as a single source precursor therefore, this
work recommends to avoid using chloroform as a solvent in AACVD technique when the
deposition carried out at high temperatures (above 500 ºC), to keep the deposited
materials pure from high level of carbon contamination.
Key Words:
Carbon thin films,
AACVD, 2D Materials.
Amorphous Carbon
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